+1 807-252-4391

Unlock the Full Potential of Your ALD or CVD System with Meaglow.

Capable of Being Used with Ammonia, Argon, Hydrogen, Nitrous Oxide, Oxygen, and Nitrogen, other gases too.

80% GaN With ICP Plasma Source
99.8% GaN With Meaglow Plasma Source

ALD With ICP Plasma Source

Crystallinity ICP

ALD With Meaglow HC Plasma Source

Crystallinity With

Al2O3 Growth Cycle % Improvement with Meaglow over ICP
InN Growth Cycle % Improvement
AlN Grown with NH3 Growth Cycle % Improvement
AlN Grown with N2H2 Growth Cycle % Improvement

Fully Customizable

Meaglow’s Hollow Cathode Plasma Sources are fully customizable. Contact us to see if our Plasma Source is compatible with your research needs and system.

Increased Efficiency

Less energy and consumable materials utilized to decrease operating costs in research and development to provide a higher return on research.

Contact Us
Amazingly Fast Startup Times

Save time by being able to grow product layers within 6 hours of a full maintenance shut down. Maintenance intervals can be months apart.

Still not convinced? Check out our results.

Upgrade Your Plasma Source Today!