Unlock the Full Potential of Your ALD or CVD System with Meaglow.
Capable of Being Used with Ammonia, Argon, Hydrogen, Nitrous Oxide, Oxygen, and Nitrogen, other gases too.
ALD With ICP Plasma Source
ALD With Meaglow HC Plasma Source
The Meaglow Plasma Source is an amazing piece of technology that has huge potential to change material science forever.Richard Stevenson
Meaglow’s Next Generation Plasma Source allowed our team to grow better GaN films with faster growth rates at lower temperatures.Necmi Biyilki
Meaglow’s Hollow Cathode Plasma Sources are fully customizable. Contact us to see if our Plasma Source is compatible with your research needs and system.
Less energy and consumable materials utilized to decrease operating costs in research and development to provide a higher return on research.
Amazingly Fast Startup Times
Save time by being able to grow product layers within 6 hours of a full maintenance shut down. Maintenance intervals can be months apart.